Acid Etching Chemical for PCB Wet Process
Proportion: 1.28 ± 0.05
Appearance: clear colorless or slightly amber
Acid Etching Chemical BM-190
This product is an acidic etching additive, used in the copper chloride etching system to etch metallic copper into a copper chloride solution.
This product uses a regeneration and complex system to eliminate the influence of Cu+ on the etching process. It is an acidic etching solution specially designed for the manufacture of high-precision, fine-line printed circuits; it can replace the Cl2, HCl / H2O2 system in most The acid copper chloride etching system is safer than Cl2 and H2O2, and the overall operation cost is lower.
1) Product Feature
1. Replace chlorine, hydrogen peroxide, safe to use and environmentally friendly in operation;
2. The control system is simple and easy to realize automatic control;
3. Low ORP control, lower overall operation cost;
4. Suitable for fine circuit production;
5. Wide operating range and easy to use.
2) Equipment Requirement & Recommendation
| Item | Requirement & Recommendation |
| Tank design | Horizontal transmission, spray design |
| Tank material | Polyethylene, polyvinyl chloride, polypropylene |
| Swing way | Mechanical reciprocating swing, 40-60cycles/min |
| Metal parts | Ti material |
| Heating and cooler materials | Quartz, titanium, PTFE |
| Filtration, circulation system | 10 micron filter element or filter bag |
| Exhaust system | Polyethylene, polypropylene, polyvinyl chloride; 100-500CFM suction volume |
3) Composition of Bath
| Tank Liquid Components (prepared by 100 liters) | Concentration (liter, volume ratio) | Specific Gravity (g/ml) |
| Deionized water | 0 | 1.0 |
| Acid etching mother liquor | 100 |
1.26 -1.38 |
Slot Matching Steps:
Add CW water, spray cycle cleaning for more than half an hour, drain away;
Add 5% NaOH solution, spray cycle cleaning for more than one hour, and drain;
Add CW water, spray cycle cleaning for more than half an hour, drain away;
Add 5% HCl solution, spray cycle cleaning for more than half an hour, and drain;
Add S acid etching mother liquor to the standard liquid level.
4）Operating Parameters
The control parameters of the acid etching solution are as follows:
| Operating Parameters | Operating Range | Best Value |
| Specific gravity S.G | 1.28 -1.38 | 1.32 |
| Acidity HCl (mol/L) | 1.5-2.5 | 2.0 |
| Cu2+(g/L) | 120 -180 | 150 |
| ORP (mv) | ≥450 | 520 |
| Temperature (℃) | 45-55 |
50 |
5) Process Control & Maintenance
Acid etching system, the addition of each component uses AQUA or similar control system, and automatic addition is implemented.
Maintenance:
Once a month, filter the etching mother liquor with carbon core + cotton core;
Once a month, clean the etching work tank with 5% NaOH solution (or special tank cleaning agent) according to the tank matching step.
6) Product Characteristic & Storage Condition
①Acid etching Chemicals
Proportion: 1.28 ± 0.05
Appearance: clear colorless or slightly amber
②Storage conditions: Store in a cool place, avoid direct sunlight; Store in a closed container; Keep away from any acidic, flammable, and oxidizable substances.
7) Safety Guidelines
①Avoid direct contact with this chemical; protect clothing and wear chemical gloves, safety glasses, etc. during operation.
②Do not breathe its vapor.
③Contaminated clothing needs to be washed before reuse.
④Before using or coming into contact with this chemical, please read the relevant Material Safety Data Sheet (MSDS) carefully. For relevant information, please ask for relevant technical personnel.
